UV Exposure lens

PRJ-1um Lithographic objective lens 0.6 um 0.17X 1.34''

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    UV lens is a projection objective lens working in the ultraviolet waveband, project the dynamic images in the image generator onto the surface of the UV glue in sequence and without deformation. The glue is exposed and cured layer by layer to form the 3D shape. 







    PRODUCT FEATURES

    ▶ 0.6μm high-end micro-nano processing exposure lens


    ▶ Assembled by optical centering process,keep the centering displacement less than 1 micron


    ▶ 0.53 high numerical aperture: achieving extremely high imaging resolution and light energy utilization efficiency


    ▶ 0.01% ultra-low distortion: ensuring precise positional accuracy of exposure patterns


    ▶ Adopt i-line optical glass with high ultraviolet transmittance


    ▶ 405nm ultraviolet wavelength: adapting to the sensitive waveband of photoresis


    ▶ Ideal for semiconductor lithography, micro-nano 3D printing ,MEMS manufacturing, microfluidic devices, and precision micro-optics fabrication.



    Product Specifications

    PRJ-1um  0.6μm UV exposure Lithographic objective lens 

    PRJ-1um UV lens.jpg

    Phone Amanda Zhou +86 15888839653 Phone Mobile +86 15888839653 Whatsapp +86 15888839653 邮箱 amanda@zwoptics.com Back